Conference: Low-energy electrons: Lithography, Imaging, and Soft Matter (LEELIS-II)



two full days


Science Park Amsterdam, WCW conference rooms, Science Park 123, 1098 XG Amsterdam, the Netherlands


We are pleased to announce LEELIS-II, a unique platform to focus on the role of low-energy electrons in imaging and nanolithography. While low-energy electrons play a key role in very diverse processes, ranging from radiology to astrochemistry, they are of particular importance for industrial extreme ultraviolet lithography (EUVL) and low-energy electron microscopy (LEEM). In both these examples, sensitive material (photoresists, soft matter) is exposed to ionizing radiation and low-energy electrons. However, we know little of how low-energy electrons propagate in different materials, or how they induce chemical reactions. Filling this knowledge gap is essential for moving EUVL and LEEM forward, and particularly for pushing lithography to its physical limits.

Following the success of the first LEELIS workshop in 2014, we address the interactions between low-energy electrons and soft matter from different perspectives. We will bring together experts from complementary fields such as condensed matter physics, EUVL, low-energy electron microscopy and engineering to come to novel insights on the physics of low-energy electrons, and the chemistry they induce.

The program of the workshop is built around invited lectures, student lectures (selected from the submitted abstracts) and poster presentations, and will allow ample time for discussions.


  • Aniket Thete (Advanced Research Center for Nanolithography, NL)
  • Willem van Dorp (Delft University of Technology, NL)
  • Ruud Tromp (IBM, USA)
  • Fred Brouwer (Advanced Research Center for Nanolithography, NL)


Thursday, November 10, 2016

  •   08.30h: Start of registration
  •   09.30h: Start of program
  •   18.30h: Workshop dinner

Friday, November 11, 2016

  •   09.30h: Start of program
  •   15.30h: End of program
  •   15.30-17.00h: Optional visit to ARCNL laboratories

Workshop dinner:

The dinner on Thursday, November 10 will be held in the restaurant “In de Waag”, Nieuwmarkt 4, Amsterdam.

All metro lines stop at the Nieuwmarkt, except line 50. For more information, see

ARCNL lab tour (optional):

At the end of the workshop program there is an optional visit to ARCNL’s laboratories.

Please register (see registration submission) for this visit if you would like to join.

Registration & submission:

The registration & abstract submission starts on June 2, 2016.

Registration fee is 125 Euro for early birds* (May 31 until October 8)

and 175 Euro for regular registration (October 8 until November 10)

*Payments must be made within the period of May 31 until October 8 to qualify for the early bird rate!

Important dates:

  • June 2, 2016: Start of Early Bird Registration, Start of Abstract Submission
  • October 8, 2016: Start of Regular Registration, Closure of registration for abstract.

Registration is open until the start of the workshop.

For more information, please click here.